[IKEOKU Tetsuya 池奥　哲也] 30-2, Kotari Ota, Nagaokakyo-shi, Kyoto 〒6170833 京都府長岡京市神足太田３０－２ Kyoto6170833;Rm No. A-630, Jia Tai International Bldg., No. 41 East Fourth Ring Middle Road, Chaoyang District, Beijing, 100052 北京市朝陽区東四環中路４１号　嘉泰国際大厦Ａ－６３０ Beijing100052 Provided is a plasma detoxification method in which all of exhaust gas charged into a thermolysis column is necessarily passed through a high-temperature region formed by a plasma jet and reliably decomposed. In a method for concentrating a plurality of plasma jets (P) toward a point (Q), the respective plasma jets (P) are generated from a plurality of plasma jet torches (2a, 2b, (2c)) installed facing toward a reaction space (D) of exhaust gas (H), the plasma jets (P) jetting toward the given point (Q) within the reaction space (D), and the exhaust gas (H) is supplied toward the point (Q) from between the plurality of plasma jet torches (2a, 2b, (2c)).

[IKEOKU Tetsuya 池奥　哲也] 30-2, Kotari Ota, Nagaokakyo-shi, Kyoto 〒6170833 京都府長岡京市神足太田３０－２ Kyoto6170833;Rm No. A-630, Jia Tai International Bldg., No. 41 East Fourth Ring Middle Road, Chaoyang District, Beijing, 100052 北京市朝陽区東四環中路４１号　嘉泰国際大厦Ａ－６３０ Beijing100052 In a water treatment device of an exhaust gas treatment device, there is provided an exhaust gas introduction nozzle with which it is possible to reliably eliminate clogging of solid reactants. This exhaust gas introduction nozzle 1 is configured from: an inner tube 2 for jetting an introduced exhaust gas H from a first jetting hole 2f into a high-humidity environment inside a water treatment tank 20; and an outer tube 5 arranged so as to surround the outer periphery of the first jetting hole 2f in the inner tube 2, the outer tube 5 jetting an inert gas F so as to surround the vicinity of the exhaust gas H jetted from the first jetting hole 2f, and having a second jetting hole 5f that forms an inert gas curtain F1 in the vicinity of the exhaust gas H.

[IKEOKU Tetsuya 池奥　哲也, NISHIDA Kazuto 西田　一人] 30-2, Kotari Ota, Nagaokakyo-shi, Kyoto 〒6170833 京都府長岡京市神足太田３０－２ Kyoto6170833;c/o Jiangchang Village Committee Courtyard, Yinghai Town, Daxing District, Beijing 100076 北京市大興区瀛海鎮姜場村村委会院内 Beijing100076 This gas adsorption device–equipped storage cabinet system comprises: a gas adsorption device–equipped storage cabinet 16 that includes an adsorption casing 12 and one or more adsorbent cartridges 14 that are installed in the adsorption casing 12; and an adsorbent regeneration device 26 that includes a regeneration casing 18, a heating means 20 that heats an adsorbent 14a in adsorbent cartridges 14 that have been removed from the gas adsorption device–equipped storage cabinet 16 and installed in the regeneration casing 18, an air supply piping system 22, and an exhaust piping system 24. The adsorbent cartridges 14 have a metal container 15 that has a fluid inlet 15a and a fluid outlet 15b provided therein. The gas adsorption device–equipped storage cabinet 16 is provided with battery-driven air delivery fans 28 that deliver air from inside the adsorption casing 12 toward the fluid inlets 15a of the adsorbent cartridges 14.

[IKEOKU Tetsuya 池奥　哲也, OGURA Akihiko 小倉　彰彦, KUZUOKA Hiroki 葛岡　弘基, TSUKADA Tsutomu 塚田　勉, YANAGISAWA Michihiko 柳澤　道彦, MORIHARA Atsushi 森原　淳, KATO Yoshihiko 加藤　義彦] 30-2, Kotari Ota, Nagaokakyo-shi, Kyoto 〒6170833 京都府長岡京市神足太田３０－２ Kyoto6170833;c/o Jiangchang Village Committee Courtyard, Yinghai Town, Daxing District, Beijing 100076 北京市大興区瀛海鎮姜場村村委会院内 Beijing100076 The present invention addresses the problem of providing a gas purification apparatus (100) capable of purifying, with high controllability, a laser gas for use in a laser beam generation device (1).　The gas purification apparatus (100) purifies a recovery gas recovered from the laser beam generation device (1) that uses a laser gas, and supplies the purified gas to the laser beam generation device (1). The gas purification apparatus is characterized by comprising: a mass flow controller (MFC) that controls the flow rate of a recovery gas; a constant volume supply device (15) that is provided downstream from the mass flow controller (MFC) and that supplies an additive gas; and a purifier (16) that is provided downstream from the constant volume supply device (15). The present invention addresses the problem of providing a gas purification apparatus (100) capable of purifying, with high controllability, a laser gas for use in a laser beam generation device (1).　The gas purification apparatus (100) purifies a recovery gas recovered from the laser beam generation device (1) that uses a laser gas, and supplies the purified gas to the laser beam generation device (1). The gas purification apparatus is characterized by comprising: a mass flow controller (MFC) that controls the flow rate of a recovery gas; a constant volume supply device (15) that is provided downstream from the mass flow controller (MFC) and that supplies an additive gas; and a purifier (16) that is provided downstream from the constant volume supply device (15).

[IKEOKU Tetsuya 池奥　哲也] 30-2, Kotari Ota, Nagaokakyo-shi, Kyoto 〒6170833 京都府長岡京市神足太田３０－２ Kyoto6170833;Rm No. A-630, Jia Tai International Bldg., No. 41 East Fourth Ring Middle Road, Chaoyang District, Beijing, 100052 北京市朝陽区東四環中路４１号　嘉泰国際大厦Ａ－６３０ Beijing100052 According to the present invention, clogging of an exhaust gas passage from a foreline pipe to a thermal decomposition tower is significantly eliminated.　An exhaust gas detoxification unit (U) includes a vacuum pump (1), an exhaust gas introduction nozzle part (20), and an exhaust gas cleaning part (40). The exhaust gas introduction nozzle part (20) includes: an exhaust gas nozzle (21); a protective gas nozzle (25) for forming a protective gas curtain (Gk) which encloses an exhaust gas (H) from the exhaust gas nozzle (21), and a moisture jetting nozzle (27) for enclosing the protective gas curtain (Gk). The exhaust gas cleaning part (40) includes a water tank (41) and a stirring part (46). The water tank (41) is a hollow container in which cleaning water (M) is stored, and is connected to the exhaust gas introduction nozzle part (20). The space between the water (M) of the water tank (41) and the ceiling part (41a) thereof is a flow passage space (45) through which the exhaust gas (H) flows. The stirring part (46) includes: a first bank (47) which is suspended from the ceiling part (41a) of the water tank (41) and of which the lower part is immersed in the water (M) in the water tank (41); and a second bank (48) which is provided downstream of the first bank (47) and of which the upper part is exposed above the water (M). According to the present invention, clogging of an exhaust gas passage from a foreline pipe to a thermal decomposition tower is significantly eliminated.　An exhaust gas detoxification unit (U) includes a vacuum pump (1), an exhaust gas introduction nozzle part (20), and an exhaust gas cleaning part (40). The exhaust gas introduction nozzle part (20) includes: an exhaust gas nozzle (21); a protective gas nozzle (25) for forming a protective gas curtain (Gk) which encloses an exhaust gas (H) from the exhaust gas nozzle (21), and a moisture jetting nozzle (27) for enclosing the protective gas curtain (Gk). The exhaust gas cleaning part (40) includes a water tank (41) and a stirring part (46). The water tank (41) is a hollow container in which cleaning water (M) is stored, and is connected to the exhaust gas introduction nozzle part (20). The space between the water (M) of the water tank (41) and the ceiling part (41a) thereof is a flow passage space (45) through which the exhaust gas (H) flows. The stirring part (46) includes: a first bank (47) which is suspended from the ceiling part (41a) of the water tank (41) and of which the lower part is immersed in the water (M) in the water tank (41); and a second bank (48) which is provided downstream of the first bank (47) and of which the upper part is exposed above the water (M).