[Rolf Seltmann, Heiko Wagner, Rolf Stephan] US TX Austin The electrical performance of sub-devices is detected and the corresponding measurement data is used to control a lithography process so as to compensate for any type of process variations during a manufacturing sequence.

[Rolf Seltmann, Heiko Wagner, Rolf Stephan] DE Dresden The electrical performance of sub-devices is detected and the corresponding measurement data is used to control a lithography process so as to compensate for any type of process variations during a manufacturing sequence.

[Rolf Seltmann, Anna Maria Minvielle] ,Am Stockteich,,;,San Jose,CA, The invention provides a method and apparatus for reducing the variance of critical dimensions in a semiconductor device, by providing a method and apparatus for measuring lens and reticle error and then providing a method and apparatus for compensating for the error. The critical dimension of a die is measured and used to create a critical dimension function CD(x,y), where y is the direction of scan and x is perpendicular to the direction of scan, for a stepper scanner. CD(x,y) is used to determine the energy distribution E(x,y). E(x,y) is separated into orthogonal functions E(x) and E(y). Changes in the exposure energy or Gray filters or other means are used to compensate for the changes in E(x) and E(y).

[SELTMANN ROLF] DE

[SELTMANN ROLF, ROLING STEFAN, WEISBUCH FRANCOIS] DE;KY

[PFORR, Rainer, WITTEKOEK, Steve, SELTMANN, Rolf] Kapeldreef 75 B-3001 Leuven;Pompstraat 16 B-3012 Wilsele;Bremdreef 1 NL-5571 Bergeyk;Hohe Strasse 21 D-8010 Dresden The system comprises a latent image detection device comprising an alignment device which uses non-actinic radiation (10) and which is intended for aligning the mask pattern with respect to the substrate (3) and is designed for detecting the measure of coincidence of a mask alignment feature and a substrate alignment feature (8). The alignment device is provided with a radiation-sensitive detection system (6) which is connected to an electronic signal processing circuit in which the amplitude of the radiation incident on the detection system is determined, which originates from a latent image, formed in the photosensitive layer, of a mask feature, in which a spatial frequency occurs which is approximately equal to the useful resolving power of the projection lens system and considerably greater than the resolving power of the alignment device.

[PAUFLER, Jörg, SELTMANN, Rolf, KÜCK, Heinz] Leonrodstrasse 54, 80636 München, DE

[SELTMANN ROLF] US

[SELTMANN ROLF] KY

[SELTMANN ROLF, SCHULZ BERND, HEMPEL FRITJOF, SCHULZE UWE] US