[Zhen Zhang, Fuqiang Li, Zhenyu Zhang, Yunping Di, Lizhong Wang, Zheng Fang, Jiahui Han, Yawei Wang, Chenyang Zhang, Chengfu Xu, Ce Ning, Pengxia Liang, Feihu Zhou, Xianqin Meng, Weiting Peng, Qiuli Wang, Binbin Tong, Rui Huang, Tianmin Zhou, Wei Yang] CN Beijing A displaying base plate and a displaying device are provided by the present application, wherein the displaying base plate includes a substrate, and a first electrode layer disposed on one side of the substrate, wherein the first electrode layer includes a first electrode pattern; a first planarization layer disposed on one side of the first electrode layer that is away from the substrate, wherein the first planarization layer is provided with a through hole, and the through hole penetrates the first planarization layer, to expose the first electrode pattern; and a second electrode layer, a second planarization layer and a third electrode layer that are disposed in stack on one side of the first planarization layer that is away from the substrate.

[Zhen Zhang, Fuqiang Li, Zhenyu Zhang, Yunping Di, Lizhong Wang, Zheng Fang, Jiahui Han, Yawei Wang, Chenyang Zhang, Chengfu Xu, Ce Ning, Pengxia Liang, Feihu Zhou, Xianqin Meng, Weiting Peng, Qiuli Wang, Binbin Tong, Rui Huang, Tianmin Zhou, Wei Yang] CN Beijing A displaying base plate and a manufacturing method thereof, and a displaying device. The displaying base plate includes a substrate, and a first electrode layer disposed on one side of the substrate, wherein the first electrode layer includes a first electrode pattern; a first planarization layer disposed on one side of the first electrode layer that is away from the substrate, wherein the first planarization layer is provided with a through hole, and the through hole penetrates the first planarization layer, to expose the first electrode pattern; and a second electrode layer, a second planarization layer and a third electrode layer that are disposed in stack on one side of the first planarization layer that is away from the substrate, wherein the second electrode layer is disposed closer to the substrate, the second electrode layer is connected to the first electrode pattern and the third electrode layer.

[ZHANG, Zhen, LI, Fuqiang, ZHANG, Zhenyu, DI, Yunping, WANG, Lizhong, FANG, Zheng, HAN, Jiahui, WANG, Yawei, ZHANG, Chenyang, XU, Chengfu, NING, Ce, LIANG, Pengxia, ZHOU, Feihu, MENG, Xianqin, PENG, Weiting, WANG, Qiuli, TONG, Binbin, HUANG, Rui, ZHOU, Tianmin, YANG, Wei] CN,Beijing 100015,No. 10 Jiuxianqiao Rd. Chaoyang District; A displaying base plate and a manufacturing method thereof, and a displaying device. The displaying base plate includes a substrate, and a first electrode layer disposed on one side of the substrate, wherein the first electrode layer includes a first electrode pattern; a first planarization layer disposed on one side of the first electrode layer that is away from the substrate, wherein the first planarization layer is provided with a through hole, and the through hole penetrates the first planarization layer, to expose the first electrode pattern; and a second electrode layer, a second planarization layer and a third electrode layer that are disposed in stack on one side of the first planarization layer that is away from the substrate, wherein the second electrode layer is disposed close to the substrate, an orthographic projection of the second electrode layer on the substrate covers an orthographic projection of the through hole on the substrate, the second electrode layer is connected to the first electrode pattern and the third electrode layer, and the second planarization layer fills the through hole to planarize the through hole.

[ZHANG, Zhen 张震, LI, Fuqiang 李付强, ZHANG, Zhenyu 张振宇, DI, Yunping 邸云萍, WANG, Lizhong 王利忠, FANG, Zheng 方正, HAN, Jiahui 韩佳慧, WANG, Yawei 王亚薇, ZHANG, Chenyang 张晨阳, XU, Chengfu 徐成福, NING, Ce 宁策, LIANG, Pengxia 梁蓬霞, ZHOU, Feihu 周飞虎, MENG, Xianqin 孟宪芹, PENG, Weiting 彭玮婷, WANG, Qiuli 王秋里, TONG, Binbin 童彬彬, HUANG, Rui 黄睿, ZHOU, Tianmin 周天民, YANG, Wei 杨维] No.10 Jiuxianqiao Rd., Chaoyang District, 中国北京市朝阳区酒仙桥路10号, Beijing 100015Beijing 100015 A display substrate and a preparation method therefor, and a display device. The display substrate comprises: a base; a first electrode layer provided on one side of the base, and comprising a first electrode pattern; a first planarization layer provided on the side of the first electrode layer facing away from the base, and provided with a through hole which passes through the first planarization layer to expose the first electrode pattern; and a second electrode layer, a second planarization layer, and a third electrode layer stacked on the side of the first planarization layer facing away from the base, wherein the second electrode layer is arranged close to the base, an orthographic projection of the second electrode layer on the base covers an orthographic projection of the through hole on the base, the second electrode layer is connected to the first electrode pattern and the third electrode layer, and the second planarization layer is filled in the through hole to planarize the through hole. A display substrate and a preparation method therefor, and a display device. The display substrate comprises: a base; a first electrode layer provided on one side of the base, and comprising a first electrode pattern; a first planarization layer provided on the side of the first electrode layer facing away from the base, and provided with a through hole which passes through the first planarization layer to expose the first electrode pattern; and a second electrode layer, a second planarization layer, and a third electrode layer stacked on the side of the first planarization layer facing away from the base, wherein the second electrode layer is arranged close to the base, an orthographic projection of the second electrode layer on the base covers an orthographic projection of the through hole on the base, the second electrode layer is connected to the first electrode pattern and the third electrode layer, and the second planarization layer is filled in the through hole to planarize the through hole.

[Zhen Zhang, Fuqiang Li, Zhenyu Zhang, Yunping Di, Lizhong Wang, Zheng Fang, Jiahui Han, Yawei Wang, Chenyang Zhang, Chengfu Xu, Ce Ning, Pengxia Liang, Feihu Zhou, Xianqin Meng, Weiting Peng, Qiuli Wang, Binbin Tong, Rui Huang, Tianmin Zhou, Wei Yang] CN Beijing A displaying base plate and a manufacturing method thereof, and a displaying device. The displaying base plate includes a substrate, and a first electrode layer disposed on one side of the substrate, wherein the first electrode layer includes a first electrode pattern; a first planarization layer disposed on one side of the first electrode layer that is away from the substrate, wherein the first planarization layer is provided with a through hole, and the through hole penetrates the first planarization layer, to expose the first electrode pattern; and a second electrode layer, a second planarization layer and a third electrode layer that are disposed in stack on one side of the first planarization layer that is away from the substrate, wherein the second electrode layer is disposed closer to the substrate, the second electrode layer is connected to the first electrode pattern and the third electrode layer.

[YANG, Wei 杨维, YUAN, Guangcai 袁广才, NING, Ce 宁策, LU, Xinhong 卢鑫泓, ZHOU, Tianmin 周天民, YANG, Xin 杨昕] No. 10 Jiuxianqiao Rd., Chaoyang District 中国北京市朝阳区酒仙桥路10号, Beijing 100015Beijing 100015 A manufacturing method for an array substrate, comprising: sequentially forming a first semiconductor pattern and a first insulation layer set on a base substrate; sequentially forming a second semiconductor pattern and a second insulation layer set on the first insulation layer set; forming two first via holes in the first insulation layer set and the second insulation layer set to expose the first semiconductor pattern, annealing the exposed first semiconductor pattern, and removing an oxide layer on the surface of the first semiconductor pattern; forming connection conducting wires in the first via holes; and forming a second via hole in the second insulation layer set to expose the second semiconductor pattern, and forming a first source and a first drain in the second via hole so that the first source or the first drain covers and connects to one of the connection conducting wires. A manufacturing method for an array substrate, comprising: sequentially forming a first semiconductor pattern and a first insulation layer set on a base substrate; sequentially forming a second semiconductor pattern and a second insulation layer set on the first insulation layer set; forming two first via holes in the first insulation layer set and the second insulation layer

[Wei Yang, Guangcai Yuan, Ce Ning, Xinhong Lu, Tianmin Zhou, Xin Yang] CN Beijing A method of manufacturing an array substrate includes: forming a first semiconductor pattern and a first insulating layer group sequentially on a base substrate; forming a second semiconductor pattern and a second insulating layer group sequentially on the first insulating layer group; forming two first via holes in the first insulating layer group and the second insulating layer group to expose the first semiconductor pattern, annealing the exposed first semiconductor pattern and then removing an oxide layer on a surface of the first semiconductor pattern; forming connecting wires in the first via holes; forming second via holes in the second insulating layer group to expose the second semiconductor pattern, and forming a first source electrode and a first drain electrode in the second via holes such that the first source electrode or the first drain electrode covers and is connected to one of the connecting wires.

[WANG, Lizhong 王利忠, NING, Ce 宁策, ZHOU, Tianmin 周天民, ZHANG, Jinchao 张劲潮, LEI, Liping 雷利平] No.10 Jiuxianqiao Rd., Chaoyang District 中国北京市朝阳区酒仙桥路10号, Beijing 100015Beijing 100015 A display substrate and a manufacturing method therefor, and a display panel. The display substrate comprises: a first semiconductor layer (25) arranged on a base substrate (21), wherein an active layer of a first thin film transistor (T1) is located on the first semiconductor layer (25), and the active layer of the first thin film transistor (T1) at least comprises a channel region (GD) and a drain electrode contact region; an interlayer insulating layer (22) arranged on the side of the first semiconductor layer (25) facing away from the base substrate (21); and a first conductive layer, which is arranged on the side of the interlayer insulating layer (22) facing away from the first semiconductor layer (25), wherein a pixel electrode (26) is located on the first conductive layer, and in a pixel unit, the pixel electrode (26) is directly electrically connected to the drain electrode contact region of the active layer of the first thin film transistor (T1) by means of a via hole penetrating the interlayer insulating layer (22). A display substrate and a manufacturing method therefor, and a display panel. The display substrate comprises: a first semiconductor layer (25) arranged on a base substrate (21), wherein an active layer of a first thin film transistor (T1) is located on the first semiconductor layer (25), and the active layer of the first thin film transistor (T1) at least comprises a channel region (GD) and a drain electrode contact region; an interlayer insulating layer (22) arranged on the side of the first semiconductor layer (25) facing away from the base substrate (21); and a first conductive layer, which is arran

[Jie HUANG, Ce NING, Zhengliang LI, Hehe HU, Nianqi YAO, Kun ZHAO, Tianmin ZHOU, Liping LEI] CN Beijing A thin film transistor, an array substrate and a manufacturing method of the thin film transistor are provided, the thin film transistor includes a base substrate; and a first active layer, a first insulating layer and a second active layer, which are sequentially arranged on the base substrate, the first active layer is in contact with the second active layer through a first via hole structure located in the first insulating layer, and non-contacted portions of the first active layer and the second active layer are separated by the first insulating layer, the thin film transistor has a plurality of active layer structures, so that the charges are gathered on two surfaces of each of the active layers, and the number of the charges gathered on the surfaces of the active layers is multiplied, and the open state current of the thin film transistor is multiplied.

[Wenqu LIU, Feng ZHANG, Qi YAO, Yong YU, Detian MENG, Zhao CUI, Zhijun LV, Yang YUE, Yuqiao LI, Dongfei HOU, Liwen DONG, Tianmin ZHOU] CN Beijing Provided is a display substrate. The display substrate includes: a substrate body; and a plurality of support pillars disposed on the substrate body, wherein the support pillar includes a first surface in contact with the substrate body, and a second surface opposite to the first surface; wherein in any direction parallel to the substrate body, a ratio of a width of the first surface to a width of the second surface is greater than or equal to 0.8, and is less than or equal to 1.2.